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Delta-doping of Semiconductors Schubert Paperback Cambridge University Press

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Delta-doping of Semiconductors

A comprehensive review of the theory and application of delta-doping of semiconductors.

E. F. Schubert (Edited by)

9780521017961, Cambridge University Press

Paperback / softback, published 22 August 2005

620 pages

24.7 x 19 x 3.1 cm, 1.081 kg

This book is the first to give a comprehensive review of the theory, fabrication, characterisation, and device applications of abrupt, shallow, and narrow doping profiles in semiconductors. Such doping profiles are a key element in the development of modern semiconductor technology. After an introductory chapter setting out the basic theoretical and experimental concepts involved, the fabrication of abrupt and narrow doping profiles by several different techniques, including epitaxial growth, is discussed. The techniques for characterising doping distributions are then presented, followed by several chapters devoted to the inherent physical properties of narrow doping profiles. The latter part of]

Delta-doping of Semiconductors Schubert Paperback Cambridge University Press

Delta-doping of Semiconductors

A comprehensive review of the theory and application of delta-doping of semiconductors.

E. F. Schubert (Edited by)

9780521017961, Cambridge University Press

Paperback / softback, published 22 August 2005

620 pages

24.7 x 19 x 3.1 cm, 1.081 kg

This book is the first to give a comprehensive review of the theory, fabrication, characterisation, and device applications of abrupt, shallow, and narrow doping profiles in semiconductors. Such doping profiles are a key element in the development of modern semiconductor technology. After an introductory chapter setting out the basic theoretical and experimental concepts involved, the fabrication of abrupt and narrow doping profiles by several different techniques, including epitaxial growth, is discussed. The techniques for characterising doping distributions are then presented, followed by several chapters devoted to the inherent physical properties of narrow doping profiles. The latter part of]

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